| 摘要 |
<p>PURPOSE:To provide good surface roughness for an object to be polished consisting of crystalline material by preparing abrasive liquid by dissolving the specific quantity of crystalline material constituting the object to be polished into a solvent. CONSTITUTION:In submerged polishing, an object to be polished consisting of crystalline material is moved relatively to an abrasive tool in abrasive liquid so as to be polished, the abrasive liquid, which is prepared by dispersing and stirring polishing abrasive grains into a solution in which the crystalline material constituting the object to be polished is dissolved in a solvent at 50% or more if saturated dissolution weight of the crystalline material constituting the object to be polished per the fixed quantity of a solvent is set to be 100% solubility, is used. In this way, elusion of the crystalline material, which constitutes the object to be polished, from the object to be polished to the abrasive liquid during polishing is suppressed, so that a deterioration phenomenon of the surface to be polished such as generation of a pit, occurrence of an abrasive grain passing trace in a preprocess (latent flaw), or generation of a blur (grinding burn) can be prevented, so that a uniform super smooth surface can be provided with high precision.</p> |
