发明名称 Enhanced chemical vapor deposition of diamond and related materials
摘要 A method for creating a uniform thin film of a high surface energy material on a substrate comprising the steps of providing an oppositely charged surface on the substrate, if such does not exist, from that of particles of the high surface energy material, exposing the substrate to an aqueous colloidal suspension of particles composed of the high surface energy material to adsorb seed particles onto the surface of the substrate, and then depositing a uniform thin film of the high surface energy material by chemical vapor deposition onto the seeded substrate.
申请公布号 US5485804(A) 申请公布日期 1996.01.23
申请号 US19940245293 申请日期 1994.05.17
申请人 UNIVERSITY OF FLORIDA 发明人 ADAIR, JAMES J.;SINGH, RAJIV K.
分类号 C23C16/02;C30B25/02;(IPC1-7):C30B29/04 主分类号 C23C16/02
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