| 摘要 |
PURPOSE:To transfer a photomask pattern on a substrate with high accuracy. CONSTITUTION:A guage plate 1, a film photomask 2 and the substrate 3 are arranged to be superposed. A first alignment mark formed on the mask 2 is made to correspond to the alignment mark of the plate 1. Then, the quantity of positional deviation between the corresponding marks is detected by a detection device 12. By pulling the circumferential edge of the mask 2 by an actuator 9 and moving a stage by actuating a moving mechanism 14 based on the detected value, the marks are mutually aligned. Besides, the second alignment mark of the mask 2 is made to correspond to the alignment mark of the substrate 3. Then, the quantity of the positional deviation between the corresponding marks is detected by the detection device 12. By moving the stage by actuating the moving mechanism 14 based on the detected value, the marks is mutually aligned. After the alignment, the pattern on the mask 2 is transferred on the substrate 3 by light from a light source. |
