| 摘要 |
PURPOSE:To obtain the subject new compound useful for producing dissolution inhibitors or the monomers for producing resins to be suitably used in photosensltive resin compositions to be exposed to far-ultraviolet light. CONSTITUTION:This compound is expressed by formula I (R1 is t- butoxycarbonyl, 2tetrahydropyranyl or 2-tetrahydrofuranyl; R2 is a divalent 7-12C saturated hydrocarbon group having an organocyclic saturated hydrocarbon group), e.g. (2-tetrahydropyranyl)oxymethyl tricyclo[5,2,1,0<2.6>]decanemethanol. A new vinyl group-contg. monomer of formula II (R3 is H or methyl) can be obtained by reaction of the compound of formula I with an equimolar amount of (meth)acryloyl chloride at ice-chilled temperature to 50 deg.C in a dehydrated methylene chloride solvent in the presence of an excess of a base. A compound of formula IV useful as a dissolution inhibitor in the lithography can be obtained by converting a carboxylic acid of formula III (R5 is a mono-tetravalent saturated hydrocarbon group; (k) is 1-4) into the corresponding acid chloride which is then reacted with the compound of formula I. |
