| 摘要 |
PURPOSE:To provide an exposure system which causes only small pattern distortion in itself or in the relation with other devices. CONSTITUTION:Distortion detecting means 15A and 15B detect the distortion occurring in the pattern of a reticle R, and based on the detection results, a control means 11 varies the pressure of a pressure adjusting means 13 so that the distortion may be get in specified condition. Hereby, the suction pressure can be put in the optimum condition, and the state of things such as that the reticle R is transformed along the suction face due to the too strong suction force can be avoided. As a result, the ways of distortion of the patterns can be made roughly uniform without recourse to a plurality of exposure systems, and superposition errors or connection errors at the time of superposition exposure or connection exposure can be reduced sharply. |
