APPARATUS FOR UNIFORMLY HEATING A SUBSTRATE

摘要

Support (7) is uniformly heated from underneath by an annular heater (8) having a vertically adjustable cooling disc (20) in the middle. This arrangement gives a very uniform temperature profile diametrically across the top of the support (7), useful in the production of semiconductor components (10) which are consistently heat treated wherever they are placed on the support (7). Support (7) is rotated and may be subjected to microwave irradiation from an overhead generator (3).