发明名称 |
Electron beam microanalyzer |
摘要 |
In an electron beam microanalyzer which has an electron beam irradiation system for irradiating a surface of a sample in a chamber an with electron beam and an optical microscope capable of observing the sample, an electron beam deflecting coil is provided. The beam is emitted by the electron beam irradiation system in a direction oblique to the sample surface and the electron beam deflecting coil bends the electron beam to align the electron beam to the optical axis of the optical microscope, the optical axis being perpendicular to the sample surface.
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申请公布号 |
US5483065(A) |
申请公布日期 |
1996.01.09 |
申请号 |
US19940321676 |
申请日期 |
1994.10.12 |
申请人 |
SEIKO INSTRUMENTS INC. |
发明人 |
SATO, MASAO;TAKEUCHI, YUKIO |
分类号 |
G01N23/225;H01J37/22;H01J37/256;(IPC1-7):H01J37/252 |
主分类号 |
G01N23/225 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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