发明名称 PHOTO MASK FOR SEMICONDUCTOR WAFER MANUFACTURE
摘要 PURPOSE:To prevent mixed use of wafers by enabling to identify the types by visual inspection, by providing the display section at arbitrary location in the element pattern regions of a plurality displayed on the mark surface and by using it as the pattern type display in forming the element pattern on a wafer.
申请公布号 JPS5421275(A) 申请公布日期 1979.02.17
申请号 JP19770086841 申请日期 1977.07.19
申请人 MITSUBISHI ELECTRIC CORP 发明人 SAKASHITA TAKESHI
分类号 G03F1/00;G03F1/38;H01L21/027;H01L21/302 主分类号 G03F1/00
代理机构 代理人
主权项
地址