发明名称 METHOD AND APPARATUS FOR DOUBLE-SIDED PATTERNING
摘要 PURPOSE:To enhance the operability of the taking-in-and-out operation of a wafer to and from a wafer holder when respectively different pattern layers are formed on both faces of the wafer. CONSTITUTION:A mask sheet 3 for one face is fixed to a first wafer holder 1 and a mask sheet 3 for the other face is fixed to a second wafer holder 2 by means of respective screwes 12b. In a state that a wafer 120 and a weight 4 are mounted on the first wafer holder 1, a film is formed, and the weight 4 is removed. Then, the first wafer holder 1 and the second wafer holder 2 are overlapped, and the wafer 120 is transferred directly to the second wafer holder 2 from the wafer holder 1.
申请公布号 JPH07335587(A) 申请公布日期 1995.12.22
申请号 JP19940129091 申请日期 1994.06.10
申请人 SHARP CORP 发明人 KAMIMURA KUNIO;SHIMADA KEIJI;KATSU TOMOJI
分类号 H01L21/28;H01L21/285;H01L21/68;H01L21/683;H01L31/04 主分类号 H01L21/28
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