CARBON-COATED BARRIER FILMS WHITH INCREASED CONCENTRATION

摘要

Carbon is deposited on a substrate through plasma enhanced chemical vapor deposition of a decomposable processor containing a seed material additive. The seed material is a hydrocarbon having a high concentration of sp<3> tetrahedrally-coordinated carbon. The seed material provides a template for the replication of sp<3> tetrahedrally-coordinated carbon atoms in the deposited amorphous carbon coating.