| 摘要 |
<p>The present invention is intended to provide a photosensitive rubber plate which is superior in transparency and strength balance and high in rate of washing with water after light exposure, and a photosensitive composition used for obtaining the rubber plate. The photosensitive composition is obtained by kneading, by the use of a kneader, 20-65 parts by weight of an A-B-A block copolymer having a (butadiene block) / (styrene block) ratio of 80.2/19.8, a vinyl bond content in butadiene block, of 30.2% and a weight-average molecular weight of 13.4x10<4>, 35-80 parts by weight of a phosphoric acid ester group-containing hydrophilic copolymer obtained by radical-copolymerizing 2-methacryloxyethyl phosphate and a monomer copolymerizable therewith, 5-300 parts by weight of a photopolymerizable ethylenically unsaturated monomer, and 0.1-10 parts by weight of a photopolymerization initiator. The photosensitive rubber plate is obtained by forming a layer of the photosensitive composition on the main surface of a substrate so as to give a laminated structure.</p> |
