发明名称 DIPOSITING METHOD BY USE OF ELECTRON BEAM
摘要 PURPOSE:To produce uniformly deposited film on th surface of a material to be deposited, by shaping depositing material, which is to be added to an evaporation dish, into plate of specific uniform thickness without forming cavities in an incorporated body of the added and the residual depositing material.
申请公布号 JPS5423083(A) 申请公布日期 1979.02.21
申请号 JP19770087411 申请日期 1977.07.22
申请人 HITACHI LTD 发明人 YOSHIDA HIROBUMI
分类号 C23C14/24;C23C14/30 主分类号 C23C14/24
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