| 摘要 |
PURPOSE:To provide a substrate processing device that does not cause a reduction in filter performance resulting from dryness in a filter. CONSTITUTION:While chemical liquid stored in a processing bath 22 circulates via a circulating pipe path 36, particles, etc., are removed by a filter device 50. The filter device 50 comprises a bag-like filter 54 having a filter internal chamber 54a, and chemical liquid is passed through the circulating pipe path 36 from an external unit of the filter 54 to the filter internal chamber 54, whereby particles, etc., are removed to be cleaned. As the chemical liquid becomes under decompression conditions when passing through the filter 54. gas melted in the chemical liquid generates. This gas is apt to remain in the filter internal chamber 54a, but discharged from the filter internal chamber 54a via a gas extracting pipe 71 without drying the filter 54. |
