PRODUCTION OF OPTICAL WAVEGUIDE HAVING REFLECTION PART

摘要

PURPOSE:To simplify the process for production by simultaneous formation of reflection parts and optical waveguides. CONSTITUTION:An underclad 3, an optical waveguide layer 11 and an etching mask are formed on a substrate 4. This mask is patterned and formed to the shape of the optical waveguides 1 and is formed with slits of a microwidth 15mum. The optical waveguides are separated by etching the optical waveguide layer after setting the speed ratio of chemical etching and physical etching at a desired value. The etching width in a transverse direction is determined by the speed of the chemical etching and the etching speed in a perpendicular direction is the sum of the chemical etching speed and the physical etching speed. The speed of the physical etching is variable with the slit width. The depth of the grooves of the reflection parts 2 and the angle of the reflection surfaces are, therefore, controllable. The simultaneous formation of the reflection parts 2 and the optical waveguides 1 is possible.