| 摘要 |
PURPOSE:To provide a method for post-treating a pattern by which the creasing of a pattern obtd. by developing or etching a precursor of polyimide is prevented when the pattern is finally heated to carry out imidation. CONSTITUTION:A coating film of a precursor of polyimide including polyamic acid and its hemiester is developed with an alkaline aq. soln. or is chemically etched to form a pattern and an acidic chemical soln. of oxalic acid, etc., is brought into contact with the pattern, preferably only the surface layer of the pattern by dipping or other method. |
