| 摘要 |
PURPOSE:To enhance the accuracy of an alignment operation regarding the alignment method of a stepper. CONSTITUTION:A pattern on a reticle 1 which has been loaded on a stepper is exposed and printed on a wafer 2 at every shot 4, referring to a plurality of alignment patterns 3 which have already been formed on the wafer 2. At this time, the exposure region of the wafer 2 is divided into a plurality of arbitrary small regions 5, the alignment patterns 3 on the wafer 2 are referred to in every small region 5 so as to be exposed and printed on the small region 5 at every shot 4. |
