RESIST COMPOSITION

摘要

The invention relates to quinone diazide sulfonic acid esters of phenol compounds of the general formula (I) or (II): <IMG> (I) or <IMG> ( II) wherein a, c and d can be the same or different and each represents a number of 0 to 3, provided that when a is 0 or 3, b is a number from 0 to 3 and when a is 1 or 2, b is 0, 1 or 2, and provided that a+b and c+d are each not less than 2; and wherein R and R' can be the same or different and each represents an alkyl group or an aryl group. These compounds, either singly or in combination, can be used as sensitizers for resist compositions containing alkali-soluble resins. The resulting compositions are positive resists having high .gamma.-values.