| 摘要 |
PURPOSE:To obtain a compsn. suitable for a chemical amplification type negative resist not causing pattern swelling phenomenon due to the absorption of a developer and capable of forming a rectangular pattern by incorporating an alkali-soluble resin, a radiation sensitive acid generating agent and a crosslinking agent. CONSTITUTION:This radiation sensitive resin compsn. contains an alkalisoluble resin, a radiation sensitive acid generating agent and a crosslinking agent made of alkoxymethylated urea resin or alkoxymethylated glycol-urea resin and capable of crosslinking the alkalisoluble resin in the presence of an acid. A compd. having a trihalomethyl group represented by the formula is preferably used as the acid generating agent. In the formula, R<1> is trihalomethyl, optionally substd. phenyl or optionally substd. naphthyl, X is halogen and plural X's may be different from one another. |
