| 摘要 |
<p>PURPOSE:To provide an X-ray mask, in which positional distortion due to X-ray irradiation generated when SiN is used as an X-ray transmitting film is reduced and by which the positional accuracy of a pattern can be maintained for a prolonged term. CONSTITUTION:An X-ray mask has at least an X-ray absorptive pattern 24, an X-ray transmitting film holding the X-ray absorptive pattern 24, and a support frame body 21 fixing the outer circumference of the X-ray transmitting film. The X-ray transmitting film is formed in structure, X-ray transmitting films 23, 25, which have compressive stress and stress of which is relaxed by applying X-rays, are formed onto both surfaces of a main X-ray transmitting film 22, which has tensile stress and stress of which is relaxed by applying X-rays, respectively.</p> |
