| 摘要 |
PURPOSE:To provide a sample rotating device of a structure, wherein 3 sample is rotated during sputtering to reduce the surface of the sample, the resolution in the depth direction of the sample is improved and at the same time, even under an ultrahigh vacuum state, the device is never made to complicate and an effect is never exerted on the analyzed result of the sample and moreover, the sample can be maintained horizontally. CONSTITUTION:A sample rotating device is provided with a turntable 1, which is fixed on an output shaft 22 of a rotatingly driving device 12 using a spiral spring as its drive source and is fixed with a sample 78 on its upper surface to rotate the sample 78. The turntable 14 is provided with a horizontal table 80 for fixing the sample 78 on its upper surface. A horizontality fine adjustment use elastic member is provided between the turntale 14 and the table 80. The table 80 is clamped on the turntable 14 using a plurality of clamping members and a horizontality fine adjustment of the table 80 is made by an adjustment of the clamping force of the clamping members. |
