| 摘要 |
<p>PURPOSE:To efficiently estimate yield and to investigate the cause of defect and foreign matter generation by performing the yield estimation and the investigation for the cause of the foreign matter generation which are usable for all processes of semiconductor device manufacture and decreasing evaluation items and operation contents. CONSTITUTION:A foreign matter measuring means 14 measures foreign matters as to a silicon substrate sample formed with film and a foreign matter data storage means 15 stores foreign matter data. The foreign matter data obtained from a foreign matter measuring means 16 at the time of pattern formation by using photomasks 13 for respective devices is transmitted to a foreign matter data storage means 17 which stores the data. Then a data collating means 18 collates the data in the foreign matter data storage means 15 and foreign matter data storage means 17 with each other and a yield decision means 19 estimates the yield by using the result.</p> |
