发明名称 Diffraction grating manufacturing method and apparatus.
摘要 <p>A manufacturing method and apparatus for a diffraction grating form the grating by interferentially exposing two divergent beams of light on a photosensitive layer, having a length L. The beams are produced using two spatial filters spaced apart by a distance C and from the photosensitive layer by a distance H. The parameters satisfy the condition H.C/L&lt;2&gt; &gt;/= 32 such that variation in the pattern interval on the photosensitive layer is within 1%. &lt;IMAGE&gt;</p>
申请公布号 EP0682272(A2) 申请公布日期 1995.11.15
申请号 EP19950202075 申请日期 1988.12.28
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 IIDA, MASANORI;ASAKURA, HIROYUKI;NISHIOKA, MINORU;MURASE, KOICHI;HAGIWARA, KIYOKAZU
分类号 G02B5/18;(IPC1-7):G02B5/18 主分类号 G02B5/18
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