发明名称 |
Radio frequency monitor for semiconductor process control |
摘要 |
A RF sensor for monitoring voltage, current and phase angle of a RF signal being coupled to a plasma reactor. Outputs from the sensor are used to calculate various properties of the plasma. These values are then utilized to characterize the process and/or used to provide feedback for in-situ control of an ongoing plasma process.
|
申请公布号 |
US5467013(A) |
申请公布日期 |
1995.11.14 |
申请号 |
US19930163221 |
申请日期 |
1993.12.07 |
申请人 |
SEMATECH, INC. |
发明人 |
WILLIAMS, NORMAN;SPAIN, JAMES |
分类号 |
H01J37/32;H01L21/66;(IPC1-7):G01R1/20;G01R21/01 |
主分类号 |
H01J37/32 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|