| 摘要 |
PURPOSE:To provide a forming method of a negative pattern having high sensitivity and high resolution for short wavelength light, especially for light near 250nm wavelength such as KrF excimer laser light. CONSTITUTION:The forming method includes the following processes. A photosensitive compsn. film 2 is formed by applying a photosensitive compsn. containing a polymer having a phenol skeleton, compd. having beta-ketocarboxylic acid ester groups, and compd. which produces acid with light on a substrate 1. The photosensitive compsn. film 2 is exposed to light for patterning and heat treated. The heat treated photosensitive compsn. film 2 is brought into contact with a basic compd. soln. The photosensitive compsn. film 2 is again heat treated, the wholly irradiated with light, and then again heat treated. The photosensitive compsn. film 2 is developed with alkali. |
