Method of forming borderless contacts using a removable mandrel
摘要
A semiconductor fabrication process for forming borderless contacts (130, 170, 172) using a removable mandrel (110). The process involves depositing a mandrel on an underlying barrier layer (100) designed to protect underlying structures (40) formed on a substrate (24). The mandrel is made from a material that will etch at a faster rate than the barrier layer so as to permit the formation of openings in the mandrel to be stopped on the barrier layer without penetrating such layer. After depositing a contact (130) in a first opening (120) formed in the mandrel, a second opening (140) is formed and a second contact (170) is deposited therein. Thereafter, the mandrel is removed and replaced with a layer of solid dielectric material (180).
申请公布号
US5466636(A)
申请公布日期
1995.11.14
申请号
US19920946993
申请日期
1992.09.17
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
CRONIN, JOHN E.;KAANTA, CARTER W.;KENNEY, DONALD M.;KERBAUGH, MICHAEL L.;LANDIS, HOWARD S.;MACHESNEY, BRIAN J.;PARRIES, PAUL;PREVITI-KELLY, ROSEMARY A.;REMBETSKI, JOHN F.