| 摘要 |
PURPOSE:To obtain a resist material having high thermal stability as well as high sensitivity to radiation such as high energy UV, electron beams or X-rays, almost independent of alkaline impurities and capable of using various high molecular compds. and additives. CONSTITUTION:This resist material contains a glyoxime deriv. represented by the formula as a photo-acid initiator. In the formula, each of R<1> and R<2> is alkyl, cycloalkyl, aryl or heteroaryl, R<1> and R<2> may bond to each other to form a cyclic structure and R<3> is alkyl, cycloalkyl, aryl or heteroaryl. |
