| 摘要 |
A rectangular vacuum-arc plasma source and associated apparatus for generating and directing a stream of plasma containing an iozized vapor of a cathode material (30) toward a substrate (44) by vacuum arc evaporation of a rectangular planar cathode (32) mounted in a rectangular plasma duct (34). The rectangular duct (34) conducts the plasma from the cathode (31) to the substrate region (44), while intercepting the molten droplets of cathode material (30) also generated by the arc. Magnets (46, 48, 40) control the arc motion on the cathode surface (33) while simultaneously generating the magnetic field which guides the plasma through the duct (34). Benefits of a filtered cathodic arc (fully ionized vapor stream, elimination of splattered droplets) are combined with the bonefits of a rectangular source (uniform evaporation from the source and uniform deposition on the substrate using linear motion). The rectangular source may be extended indefinitely in length, thus allowing coating or ion implantation on large or long substrates.
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