| 摘要 |
PURPOSE: To disclose an improved semiconductor treating apparatus and method, using a polarized radiation energy. CONSTITUTION: A photolithographic apparatus 10 is provided for exposing a radiation-sensitive material layer 12 on a semiconductor wafer 14 and comprises a polarized radiation energy source 18, mask 20 and lens 22. The radiation energy from the source 28 is polarized in specified direction by a polarizing filter 30, and passes through the mask 10 to expose the layer 12 in a specified pattern. A drive 32 can rotate the filter 30 to give two or more polarizing directions to the polarized radiation energy in one cycle of exposure. |
