发明名称 POSITION SHIFT CORRECTING METHOD FOR WAFER
摘要 PURPOSE:To detect the degree of the position shift of a true center of a wafer and a rotary center and correct the coordinates values of a foreign substance data in a surface inspecting apparatus. CONSTITUTION:A position sensor part 8 composed of three optical sensors Sa, Sb, Sc is installed and after an orientation flat of a wafer 1 is positioned in Y-direction, three measuring points in the outer circumference are detected and coordinates values for respective points are obtained and based on these values, position difference (DELTAx, DELTAy) is calculated and the X-Y coordinates values of the foreign data saved in a MEN (memory) 42 are corrected. As a result, at the time of observation of the foreign substance by a SEM(scanning electron microscope), an desired foreign substance can be captured easily.
申请公布号 JPH07280741(A) 申请公布日期 1995.10.27
申请号 JP19940087382 申请日期 1994.04.01
申请人 HITACHI ELECTRON ENG CO LTD 发明人 IIZUKA SHIGEHARU;HONDA MASASHI
分类号 G01B11/26;G01B11/00;G01B11/30;G01N21/88;G01N21/94;G01N21/956;G06T1/00;G06T7/00;H01L21/66;H01L21/68 主分类号 G01B11/26
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