| 摘要 |
The invention relates to a method of manufacturing a device which starts with a support bar (1) with a first main surface (2) provided with a groove (3) suitable for accommodating a semiconductor element (10), which groove has walls (4, 5) on which conductor tracks (6, 7) are provided which continue over the first main surface (2). Such a method is particularly suitable for making support bars which serve as envelopes for semiconductor elements. According to the invention, the method is characterized in that the conductor tracks (6, 7) are provided through patterning of a conductive material by means of a patterned photoresist (12) which is provided on the support bar (1) and irradiated from two directions (13, 14) at such an angle (15, 16) to the first main surface (2) and to the groove (3) that a bottom (8) of the groove (3) is not and portions of the walls (4, 5) and of the first main surface (2) are irradiated, after which the photoresist (12) and an applied layer of conductive material (9) are brought into a pattern. The method according to the invention is more reliable than the known method. In the method according to the invention, the geometry of the support bar (1) is used for irradiating a photoresist (12). An edge (17, 18) of the groove (3) screens the bottom (8) of the groove (3), so that this bottom is not irradiated. Irradiation from two directions (13, 14) achieves that the photoresist (12) on the first main surface (2) and on both walls (4, 5) of the groove (3) is irradiated. |
