| 摘要 |
PURPOSE:To provide a pellicle for lithography composed of amorphous fluorine- base polymers having improved pressure resistance against air blow and the like compared with a conventional well-known pellicle consisting of a single layer of an amorphous fluorine-base polymer. CONSTITUTION:This pellicle film consists of a multilayered film of at least two kinds of amorphous fluorine-base polymers. The pellicle is produced by alternately laminating amorphous fluorine-base polymer films having >=30MPa tensile yield strength and <1.4GPa initial tensile elasticity and amorphous fluorine polymer films having <30MPa tensile yield strength and >=1.4GPa initial tensile elasticity to form a multilayered film of at least two layers. |
