发明名称 PATTERN MATCHING METHOD AND MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To obtain an evaluation result with high reliability by multiplying number of quantizing units in which state types coincide at respective state types by a predetermined weighting coefficient and evaluating conformability with a value obtained by averaging the result with the number of the types. CONSTITUTION:The total number of white and black pixels is obtained from image data, and a weighting coefficient GW ((number of entire pixels)/(number of white pixels)) of the white pixels and a weighting coefficient GB ((number of entire pixels)/(number of black pixels)) of the black pixels are obtained (S1, S2). Then, conformity PW ((number of coincident white pixels)XGW) of the white pixel and conformity PB ((number of coincident black pixels)XGB) are obtained (S3, S4). Conformity Z=(PW+PB)/2 is obtained, and conformability of a pattern to be collated to a reference pattern is evaluated (S5). Thus, an evaluation result with high reliability can be obtained.
申请公布号 JPH07263482(A) 申请公布日期 1995.10.13
申请号 JP19940049088 申请日期 1994.03.18
申请人 FUJITSU LTD;FUJITSU LSI TECHNOL KK 发明人 OKUBO TAKEHITO
分类号 H01L21/66;G06T1/00;G06T7/00;H01L21/60;H01L23/50 主分类号 H01L21/66
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