| 摘要 |
PURPOSE:To reduce the local bulges of light intensity distribution contour lines appearing near the tip of the side section of a shading section pattern by providing recesses at the specific positions of the side section of the shading section pattern formed on a master drawing substrate for projection exposure. CONSTITUTION:Oblique line sections are a shading section pattern 1, a white portion is a transmission section 2, and recesses 3 are provided near the tip of the side section of the shading section pattern 1 (at positions corresponding to local bulges (a) generated on light intensity distribution contour lines in the conventional example). The shape and size of the recesses 3 may be optional as far as the shape of the light intensity distribution contour lines is improved. Peaks of the bulges of the light intensity distribution contour lines appear near the position of lambda/NA, where lambda indicates the exposure wavelength and NA indicates the number of openings, from the tip of the projection pattern of the shading section pattern 1 on an exposure substrate 15 without depending on the line width or the repetition number of the shading section pattern l so much, thus the section of the shading section pattern 1 is improved. |
