| 摘要 |
A computer process of creating a Moving Electron Beam Exposure System (MEBES) pattern-generation file, that is to be used in the manufacture of integrated-circuit masks, from a technology-independent and semiconductor-process independent layout-design, by transmitting a scaleable and process-independent layout design to a computer, selecting the layers necessary for a particular semiconductor-process, selecting the scale to which the layout design will be converted, converting the layout design to that scale, positioning the layout design in a full-wafer or reticle-based layout, adding scribe lines, converting the layout design to a format acceptable to a conversion program, converting the layout design to a MEBES pattern-generation file, and transmitting the MEBES pattern-generation file in a format acceptable to a manufacturer of integrated-circuit masks.
|
