发明名称 Doping semiconductor crystals, esp. silicon@ crystals
摘要 Doping semiconductor crystals comprises contacting a crystalline body, pretreated by ion implantation, with a medium contg. electrically active dopant or several dopants, treating at temp. below the recrystallisation temp., and then tempering for a short time at a sufficiently elevated temp. to recrystallise and electrically activated.
申请公布号 DE19505818(A1) 申请公布日期 1995.09.07
申请号 DE19951005818 申请日期 1995.02.09
申请人 MOHR, ULRICH, PROF. DR., 14532 KLEINMACHNOW, DE;LEIHKAUF, RAINER, DIPL.-PHYS., 10249 BERLIN, DE;JACOB, KERSTIN, DIPL.-ING., 12524 BERLIN, DE;BAUMANN, KURT, DIPL.-ING., 14513 TELTOW, DE;BORN, KIRSTEN, 12683 BERLIN, DE 发明人 MOHR, ULRICH, PROF. DR., 14532 KLEINMACHNOW, DE;LEIHKAUF, RAINER, DIPL.-PHYS., 10249 BERLIN, DE;JACOB, KERSTIN, DIPL.-ING., 12524 BERLIN, DE;BAUMANN, KURT, DIPL.-ING., 14513 TELTOW, DE;BORN, KIRSTEN, 12683 BERLIN, DE
分类号 C23C14/48;C30B31/22;H01L21/225;H01L21/265;H01L21/326;(IPC1-7):H01L21/22;H01L21/268;H01L21/324 主分类号 C23C14/48
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