发明名称 Wide-field exposure optical system
摘要 A wide-field exposure optical system in which the projection is performed by scanning an object to be projected with a predetermined scan width. The optical system comprises an illuminating section for illuminating the object to be projected in a circular arc region, a reflecting and refracting optical system for correcting the aberration of a circular arc region having its center on the optical axis and for forming, within an image surface, an image of the object to be projected illuminated by the illuminating section as a circular arc, a driving means for moving light-receiving members arranged on the object to be projected and on the image surface relative to the illuminating section and the reflecting and refracting optical system, and the reflecting and refracting optical system being formed by a first lens group, a second lens group and one concave mirror. The second lens group comprises a second lens which is a convex lens and a third lens which is a concave lens.
申请公布号 US5448416(A) 申请公布日期 1995.09.05
申请号 US19930025340 申请日期 1993.03.03
申请人 KABUSHIKI KAISHA TOPCON 发明人 OKUMURA, TOSHIKI;YOSHINO, HISAKAZU;SATOH, TAKUJI
分类号 G02B17/08;G02B17/02;G02B27/18;G03F7/20;(IPC1-7):G02B17/00 主分类号 G02B17/08
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