| 摘要 |
<p>PURPOSE:To greatly improve design efficiency in designing of a Levenson type phase shift mask by automatically arranging shifters and automatically forming the final layout increased in the scale of integration as far as possible. CONSTITUTION:This method for designing the photomask comprises designing the layout of the photomask provided with the phase shifters to impart a phase difference of 180 deg. to incident light transmitted through transparent regions on the transparent regions of the photomask formed with the plural transparent regions and opaque regions. The first layout data arbitrarily setting the distances between the adjacent transparent regions are formed in this method (step 1). The regions where the phase difference of the light transmitted through the adjacent transparent regions in this first layout data is 180 deg. from each other and the regions where the phase difference is 0 deg. with each other are determined (step 2). The distance between the transparent regions is set at S1 in the transparent regions adjacent to each other at the phase difference 180' and the distance between the transparent regions is set at S2 in the transparent regions adjacent to each other at the phase difference 0 in accordance with the first layout data and the second layout data satisfying the relation S1<S2 is formed (step 3).</p> |
