Material vaporisation in a vacuum or low gas pressure

摘要

Process for vaporising material by means of an arc discharge in a vacuum or low gas pressure by bombardment of the material, which is connected to the anode and constitutes the medium for the discharge, by electrons from the arc discharge, esp. for coating a substrate by vapour deposition. The cathode is heated and the electrons necessary for maintaining the arc discharge are emitted from the cathode by thermal and field emission and/or are formed in the plasma. Appts. for the process is also claimed.