| 摘要 |
PURPOSE:To more efficiently remove fine dust of silicon dioxide or the like and to extend the use life of a filter member. CONSTITUTION:A semiconductor manufacturing apparatus 10 and a filter device 11 are connected by piping 15. The filter device 12 consists of a filter 12 and a catalyst tank 13 and a hot air sending-in unit 20 consisting of a heater 21 and a blower 22 is installed on the way of the piping 15. Hot air is generated by the unit 20 to be sent into the piping 15. By this constitution, the adverse effect of moisture generated by the oxidizing reaction of exhaust gas due to hot air is prevented and the adhesion of silicon dioxide to the inner surface of the piping or the fixing thereof to a filter member can be prevented. |
