HALFTONE TYPE PHASE SHIFT MASK AND ITS PRODUCTION AND PATTERN TRANSFER METHOD

摘要

PURPOSE:To provide a halftone type phase shift mask capable of preventing a possibility of generation of defects by double exposure while minimizing a range where light shielding regions consisting of many very small light transmissive parts are formed and a process for producing this mask and a pattern transfer method using the halftone phase shift mask. CONSTITUTION:The inside of projecting regions DELTAI which are nontransfer regions adjacent to the boundaries between a transfer region I having an approximately square shape and the nontransfer regions In around this transfer region I is composed of light translucent parts which allow transmission of exposing light of the intensity substantially not contributing to exposing. In addition, the parts in contact with one side each of square four corners partitioning the contours of the transfer region I within the projecting regions DELTAI are provided respectively with one piece each of the approximately square light shielding parts 6 formed by providing the light translucent parts with the many very small light transmissive parts of a size below the resolution threshold.