| 摘要 |
PURPOSE:To develop a resist to have a rectangular cross-section with high uniformity in the line width of resist. CONSTITUTION:Developer 14 is fed onto an exposed resist on a wafer 11 which is then rotated at 10 r.p.m.(lower than 30 r.p.m.) thus developing the resist. Temperature distribution of the developer 14 is made more uniform in the plane of the wafer 11 and the uniformity in the line width of resist is enhanced by making uniform the developing rate thereof. Furthermore, since the rotational speed is low, the developer 14 is not stirred so much and the profile of resist can be made rectangular. |
