| 摘要 |
<p>PURPOSE: To prevent formation of bridges of a material deposited between a carrier and wafer held thereon by allowing a slot means to house at least a part of an edge which is in contact with the outside of the wafer therein and holding the wafer in an upright position. CONSTITUTION: A wafer carrier 10 has a structure such that it can hold at least one or preferably a plurality of wafers W made of a semiconductor material. Each of the wafer W is of circular shape. In addition, it has a large flat face F and thin circumferential edge E, which is extended on the periphery of the wafer and is in contact with the outside thereof. The wafer carrier 10 holds a wafer, while a polysilicon layer is subjected to be vapor-deposited in a reactor by low-pressure chemical vapor deposition, during the working of the wafer W.</p> |
