发明名称 Plasma workpiece processing
摘要 The process for plasma working of a workpiece, in a vacuum vessel, initially ignites the plasma and then the LC resonance circuit (15) is set so that, with a constant HF voltage at the HF electrode (2), the electrical power given in the plasma is at max.. Also claimed is an appts. with a monitor (8) to measure the power delivered between the generator (6) and the HF electrode (2). A monitor (7) measures the voltage at the HF electrode (2), between the electrode (2) and earth.
申请公布号 DE4404077(A1) 申请公布日期 1995.08.10
申请号 DE19944404077 申请日期 1994.02.09
申请人 LICENTIA PATENT-VERWALTUNGS-GMBH, 60596 FRANKFURT, DE 发明人 SCHADE, KLAUS, PROF. DR., 01307 DRESDEN, DE;STEINKE, OLAF, DIPL.-ING., 13156 BERLIN, DE
分类号 C23C16/509;H01J37/32;(IPC1-7):H05H1/46;C23C16/24 主分类号 C23C16/509
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