摘要 |
The process for plasma working of a workpiece, in a vacuum vessel, initially ignites the plasma and then the LC resonance circuit (15) is set so that, with a constant HF voltage at the HF electrode (2), the electrical power given in the plasma is at max.. Also claimed is an appts. with a monitor (8) to measure the power delivered between the generator (6) and the HF electrode (2). A monitor (7) measures the voltage at the HF electrode (2), between the electrode (2) and earth.
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申请人 |
LICENTIA PATENT-VERWALTUNGS-GMBH, 60596 FRANKFURT, DE |
发明人 |
SCHADE, KLAUS, PROF. DR., 01307 DRESDEN, DE;STEINKE, OLAF, DIPL.-ING., 13156 BERLIN, DE |