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经营范围
发明名称
Sputtering process and an apparatus for carrying out the same.
摘要
申请公布号
EP0275021(B1)
申请公布日期
1995.08.09
申请号
EP19880100054
申请日期
1988.01.05
申请人
HITACHI, LTD.
发明人
TATEISHI, HIDEKI;SAITO, HIROSHI;SASAKI, SHINJI;HORIUCHI, MITSUAKI
分类号
C23C14/35;H01J37/32;H01J37/34;(IPC1-7):C23C14/34
主分类号
C23C14/35
代理机构
代理人
主权项
地址
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