发明名称 EXHAUST GAS TREATMENT APPARATUS
摘要 <p>PURPOSE:To provide an exhaust gas treatment apparatus capable of efficiently performing dilution and capable of safely and easily performing internal washing. CONSTITUTION:In an exhaust gas treatment apparatus 1 equipped with a mixing treatment chamber mixing introduced exhaust gas with water, a mist treatment chamber 3, the dilution chamber 4 communicating with the mixing treatment chamber 2 and an exhaust gas introducing part 5 guiding exhaust gas to the dilution chamber 4, a water contact mechanism 50 bringing the exhaust gas into contact with water before introducing the same into the dilution chamber 4 is provided to the exhaust gas intoruding part 5. Further, in this exhaust gas treatment apparatus 1, a cross plate 81 is provided between a filter 8 and a fan 9 and the inner surfaces of the mixing treatment chamber 2, the mist treatment chamber 3 and the dilution chamber 4 are coated with PVC 10 and a freely openable and closable door 42 is provided to the dilution chamber 4 and an HF supply mechanism 71 supplying fluoric acid automatically is provided.</p>
申请公布号 JPH07204454(A) 申请公布日期 1995.08.08
申请号 JP19940017939 申请日期 1994.01.17
申请人 SONY CORP 发明人 OFUJI YOSHIO
分类号 B01D53/34;B01D53/77;H01L21/205;(IPC1-7):B01D53/34 主分类号 B01D53/34
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