| 摘要 |
PURPOSE: To solve the contraction problem of a resist during a lithographic process and, as a result, to reduce an image in the resist and, in turn, strains caused in a device pattern in the case of using a polymer contng. malaymid as a resist in a lithographic method for manufacturing a device. CONSTITUTION: A region for a material, which reacts to irradiation, is formed on a substrate. This irradiation-sensitive material includes a polymer component which is a copolymer product of a malaymid monomer and at least two other monomers. Unstable acid radicals hang down from one of the monomers with which the malaymid monomer copolymerizes and the monomer, from which the unstable acid radicals hang down, occupies <50% of the monomers which form copolymers. These unstable acid radicals do not hang down from the malaymid monomer. |
