| 摘要 |
<p>Surface modification of ceramic substrates (32) using plasma immersion ion implantation and deposition is disclosed. This method may be carried out using a vacuum arc deposition system with a metallic or carbon cathode (10). By operating a plasma gun (28) in a long-pulse mode and biasing the substrate holder (31) with short pulses of a high negative voltage, direct ion implantation, recoil implantation, and surface deposition are combined to modify the near-surface regions of the head or substrate in processing times which may be less than 5 min. The modified regions are atomically mixed into the substrate. This surface modification improves the surface smoothness and hardness and enhances the tribological characteristics under conditions of contact-start-stop continuous sliding. These results are obtained while maintaining original tolerances.</p> |
