Sputtering target and method for producing same

摘要

A sputtering target having a relative density of 90% or more and a single-phase structure for forming a indium-tin oxide layer of low resistance is produced by pressing a composite powder of indium oxide and tin oxide having an average diameter of 0.1 mu m or less and a tin content controlled to 1.5-6 weight %; and sintering the pressed composite powder at 1500 DEG -1700 DEG C. in an oxygen atmosphere pressurized at 1-10 atm.