ROTARY SUBSTRATE DEVELOPING METHOD AND DEVICE THEREFOR

摘要

PURPOSE:To avoid the particle production in the latter step by removing any needless posiresist film in the developing step even if the needless posiresist film is left on the peripheral edges or ends on a substrate surface in the previous steps before the developing step. CONSTITUTION:A substrate 1 whereon a posiresist film is formed is rotatably held by a substate holding means 1 and then a developer is jetted from a nozzle 4 over the rear surface of the substrate l held by the holding means 2 so that the needless remaining posiresist film on the peripheral ends, etc., of the substrate 1 may be melted and removed.