| 摘要 |
PURPOSE:To realize the pattern transfer with high precision by a method wherein the change in the focus position of a projection optical system due to the change in the atmospheric pressure or environmental air pressure of a projection exposure device is avoided to improve the dimensional precision and the alignment precision of a transfer pattern. CONSTITUTION:The projection aligner is composed of an illumination optical system 4, a reticle 5, a projection optical system for transferring the pattern of the reticle 5 to a semiconductor wafer 22 and an X-Y table 21 on which the semiconductor wafer 22 is mounted comprising a part of the projection optical system 7. In such a constitution, the title projection aligner including a movable lens 39 held by a movable lens supporter 40, a piezoelectric element 16 for moving vertically the movable lens 39 with respect to the reticle 5 through the intermediary of the supporter 40 and a controller 24 for controlling the piezoelectric element 16 by the signals from a barometer 23 for detecting the environmental air pressure can correct the change in magnification of the image of the semiconductor wafer 22 of the projection optical system 7 due to the change in the environmental air pressure by moving vertically the movable lens 39 with respect to the reticle 5 according to the environmental air pressure. |
